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Thin Film Materials, Surface Modification, and Nano–scale Engineering

Our research group studies the fundamentals of advanced thin film material synthesis and nano–scale structure engineering.  A primary focus in our group is Atomic Layer Deposition (ALD) technology for highly conformal fabrication of inorganic insulators and metals with atomic-scale control of growth and interface formation.  We are working to extend ALD into new and expanding areas, including Molecular Layer Deposition, where the chemical concepts of ALD are utilized for atomic–level integration of organic monomer and molecular building blocks into well defined thin films.  Low temperature processing is a long–standing theme in our work,  to enable non–conventional materials, including polymers or biologically active surfaces to be coated and modified.  Our history in solar energy materials is helping us to examine ALD for applications PV and other energy harvesting devices.  A new and growing focus is on modification of high surface area 3D structures, including nonwoven fibrous mats and natural and synthesized fabric structures for biological integration or bio–separation systems.  

Research challenges in nano-scale thin films and ALD technology